Vacuum-plasma Module for the Forming of Structure Element Base of Nanoelectronics and Microenergetics

1Rudenko, EМ, 1Korotash, IV, 1Semenyuk, VF, 2Shamrai, KP
1G.V. Kurdyumov Institute for Metal Physics, NAS of Ukraine, Kyiv
2Institute for Nuclear Research, NAS of Ukraine, Kyiv
Nauka innov. 2010, 6(3):36-38
https://doi.org/10.15407/scin6.03.036
Section: Scientific and Technical Innovative Projects of National Academy of Sciences of Ukraine
Language: Ukrainian
Abstract: 
The vacuum-plasma module — specialized technological unit of precision size etching and multifunction ion-plasma treatment is created. It is based on the two-figure system, consisting of high selective plasma-chemical and high anisotropic reactively-ionic etch sources. The module is intended for the forming of structure element base of nanoelectronics and nanodevice topology, thermal emission sources, elements converting sun and thermal energy into electrical energy.
Keywords: ion-plasma technologies, nano- and microelectronics, plasma capacity HF source, plasma helicon source, vacuum-technological equipment
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