Vacuum-plasma Module for the Forming of Structure Element Base of Nanoelectronics and Microenergetics
| Title | Vacuum-plasma Module for the Forming of Structure Element Base of Nanoelectronics and Microenergetics |
| Publication Type | Journal Article |
| Year of Publication | 2010 |
| Authors | Rudenko, EМ, Korotash, IV, Semenyuk, VF, Shamrai, KP |
| Short Title | Nauka innov. |
| DOI | 10.15407/scin6.03.036 |
| Volume | 6 |
| Issue | 3 |
| Section | Scientific and Technical Innovative Projects of National Academy of Sciences of Ukraine |
| Pagination | 36-38 |
| Language | Ukrainian |
| Abstract | The vacuum-plasma module — specialized technological unit of precision size etching and multifunction ion-plasma treatment is created. It is based on the two-figure system, consisting of high selective plasma-chemical and high anisotropic reactively-ionic etch sources. The module is intended for the forming of structure element base of nanoelectronics and nanodevice topology, thermal emission sources, elements converting sun and thermal energy into electrical energy.
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| Keywords | ion-plasma technologies, nano- and microelectronics, plasma capacity HF source, plasma helicon source, vacuum-technological equipment |
| References | 1. Shinohara S., Shamrai K.P. Effect of electrostatic waves on a rf field penetration into highly collisional helicon plasmas. Thin Solid Films. 2002. V. 407. No 1-2. P. 215-220.
https://doi.org/10.1016/S0040-6090(02)00041-X 2. Kral'kina E.A. Induktivnyj vysokochastotnyj razrjad nizkogo davlenija i vozmozhnosti optimizacii istochnikov plazmy na ego osnove. UFN. 2008. 178(5): 519-540 [in Russian]. 3. Rudenko E.M., Korotash I.V., Semenjuk V.F., Shamraj K.P. Ustanovka dlja precyzijnogo ionno-plazmovogo formuvannja vuglecevyh nanotrubok v jedynomu vakuumnotehnologichnomu cykli. Nauka innov. 2009. 5(5):5-8 [in Ukrainian]. https://doi.org/10.15407/scin5.05.005 |