The plant for ionic-plasma formation carbon nanotubes and other nanostructures is created. The plant contains highvacuumpump system, working gases letting system, helicon discharge chamber, drift chamber, vacuum-arc sources, power sources and monitoring system with a small-sized optical spectrometer. The plant integrates processes plasma-enhanced chemical vapour-phase deposition, plasma clearing and activation of a substrate surface, deposition of transitive adhesive layers and metal-catalyst, direct formation process of carbon nanostructure.