Photopolymeric Composite Materials for Coatings Board
Title | Photopolymeric Composite Materials for Coatings Board |
Publication Type | Journal Article |
Year of Publication | 2008 |
Authors | Sysyuk, VG, Grishchenko, VK, Granchak, VM, Bubnova, AS, Davyskyba, PM |
Short Title | Nauka innov. |
DOI | 10.15407/scin4.06.005 |
Volume | 4 |
Issue | 6 |
Section | Scientific and Technical Innovative Projects of National Academy of Sciences of Ukraine |
Pagination | 5-11 |
Language | Ukrainian |
Abstract | Photopolymerable compositions based on alkali-soluble polymers with oligoetheracrylate and epoxyacrylate are developed for creation of protective coatings (masks) of board circuit wiring. The influence of oligomer components on physicochemical and physicomechanical properties of a polymeric material is investigated. Optimization of photosensitive composition structure, which was used for screen printing manufacturing, is lead with the purpose of the high quality protective coating (mask) image formation and its testing at manufacture.
|
Keywords | board, imaging, modification, optimization, photopolymer composition, protective coating, reactive oligomer |
References | 1. Kochkin V.F., Turevich A.E. Lakokrasochnye materialy i pokrytija v proizvodstve radioapparatury. Leningrad: Himija, 1991 [in Russian].
2. Rub L.N., Uvarova R.M. Tehnika i tehnologija fototehnicheskih processov. Moskva: Izd. MGAP, Mir knigi, 1985 [in Russian]. 3. Tkachuk M.P. Trafaretnyj druk. Navchal'nyj posibnyk. Kyi'v, 2000 [in Ukrainian]. 4. Shibanov V. Minimumy ili ocherki o fotopolimerizujushhihsja materialah. Kiev, 2002 [in Russian]. 5. Grishhenko V.K., Masljuk V.F., Gudzera S.S. Zhidkie fotopolimerizujushhiesja kompozicii. Kyiv: Nauk. Dumka,1985 [in Russian]. 6. Masljuk V.F., Hranovskij V.A. Fotohimija polimerizacionno sposobnyh oligomerov. Kyiv: Nauk. Dumka, 1989 [in Russian]. 7. Sedov L.N., Mihajlova Z.V. Nenasyshhennye polijefiry. Moskva: Himija, 1989 [in Russian]. 8. Gul' V.E., Kuleznev V.N. Struktura i mehanicheskie svojstva polimerov. Moskva: Vysshaja shkola, 1972 [in Russian]. 9. Svetochuvstvitel'nost' i kinetika fotopolimerizacii lakov UF-otverzhdenija. Oljanishen T.V., Sysjuk V.G., Marshalok I.I., Kachanovskaja L.D. Kompozicijni polimerni materiali. 2002, 25(2): 90-96 [in Russian]. 10. Sysjuk V.G., Granchak V.M., Klochaj O.I. Napovnennja oligomermonomernyh system u fotopolimeryzacijnozdatnyh materialah dlja tehnologii' vygotovlennja drukars'kyh plat. Polimernyj zhurnal. 2004, 26(4): 249-253 [in Ukrainian]. 11. Trafaretnyj polimeryzacijnozdatnyj material Fotokom-Ts. Kurman V., Karpenko V., Sysjuk V., Granchak V. Drukarstvo. 1998, 8: 30-33 [in Ukrainian]. 12. Patent 76899, Ukrai'na. Fotopolimeryzacijnozdatna kompozycija dlja zahysnyh pokryt. V.M. Granchak, V.G. Sysjuk, S.Ja. Kuchmij [in Ukrainian]. 13. Karjakina M.I. Ispytanija lakokrasochnyh materialov i pokrytij. Moskva: Himija, 1988 [in Russian]. |