8(2)07
Nauka innov. 2012, 8(2):34–38
https://doi.org/10.15407/scin8.02.034
P. Chapon1, O. Kostenko2
1HORIBA Scientific, Longjumeau (France)
2PAT «Macrochim», Kiev
Characterisation of Element Distribution in Films and Coatings with RF GD-OES and TOFMS™ Methods
Section: The World of Innovations
Language: Russian
Abstract: Methods of optical emission spectrometry of grow HFdis charge are described. The unique characteristics of GD plasma, which allow performing very fast surface erosion, are presented.
Key words: grow discharge plasma, elemental distribution, thin film, surface analysis.
References:
1. Marcus K., Broeckaert J. Glow Discharge Plasmas in Analytical Spectroscopy. John Wiley & Sons, Chichester (2003) Ch 2, 15-69.
2. Nelis T., Payling R. Practical Guide to Glow Discharge Optical Emission Spectrometry. RSC Analytical Spectroscopy Monographs; RSC 2003, 212 p.
3. Escobar R. et al. Towards nanometric depth resolution in multilayer depth profiling: a comparative study of RBS, SIMS, XPS and GDOES. Anal. Bioanal. Chem. (2010), 396: 2725-2740.
https://doi.org/10.1007/s00216-009-3339-y
4. Tempez A. et al. 18O/16O isotopic separation in anodictantala films by glow discharge time-of-flight mass spectrometry, Surface and Interface Analysis, 41, 966-973 (2009).
https://doi.org/10.1002/sia.3129
5. Le Coustumer P., Chapon P., Tempez A. et al. Thin and thick films analysis. chapter 26 of Applied Handbook of Mass Spectrometry. John Wiley & Sons (2006), 72-80.
6. Shimizu K., Mitani T. New Horizons of Applied Scanning Electron Microscopy. Springer. 1st Edition., 2010, 182 p.
https://doi.org/10.1007/978-3-642-03160-1